Teoxane participation at AMWC 2024: Elevating Aesthetic Excellence
Together, we pushed the boundaries of facial aesthetics, aiming for excellence in patient care and outcomes.
Founded in 2003 by Valérie Taupin, Teoxane Laboratories, located in Geneva, are a testament to innovation and quality in the field of Hyaluronic Acid dermal fillers**** and dermocosmetics*.
Our two-decade commitment to scientific research and consumer safety highlights our approach to facial aesthetics. We strive to enhance beauty in its many forms, providing educational insights and innovative solutions.
At Teoxane, we welcome each individual's unique journey towards beauty, empowering lives through our advanced, safe science and high-performance products1.
As a laboratory, we are dedicated to the innovative creation of Hyaluronic Acid (HA) formulations, setting new standards in the world of aesthetics and skincare.
Guided by innovation, excellence, and independence, Teoxane Laboratories has become a recognized name in aesthetic medicine worldwide. The following achievements offer a snapshot of our dedication and the impact we have made in the field.
Operating in over 90 countries, our presence signifies a trust in our expertise and innovations worldwide
A milestone which underlines our reliability and the confidence that healthcare professionals and patients place in our products.
Our growing team embodies our commitment to quality and the pursuit of excellence in aesthetic medicine.
With over 180 patent titles, 15 unique formulations, and 14 at home products we showcase our continuous innovation and leadership in Hyaluronic Acid technology.
Annually, we educate over 50,000 professionals, guided by 300 Key Opinion Leaders. This reflects our dedication to not just lead the discussion but also promote a better and safer industry.
Our pionneering approches ATP and MLT highlight our commitment to bringing new solutions to aesthetic medicine.
Through our dedication to hyaluronic acid, we aspire to make this vision a reality for every individual.